Nanoparticles and Nanostructured Cobalt Deposition using Dense Plasma Focus Device and their Characterization

Nanofabrication through plasma route has been used for fabrication of Nanoparticles and Nanostructured materials as it is indicated that plasma route is superior to other physical and chemical techniques. Srivastava has established, the deposition of nanoparticles through plasma route on different substrates using Dense Plasma Focus device (DPF). DPF is a source of hot (1-2 keV) and dense (10 26 m ) plasma. The hot and dense argon plasma formed during focus phase causes the ablation of the cobalt disc placed at the top of the anode. Brass holder is inserted from the top of the plasma chamber and is placed above the anode. The cobalt ions along with the argon ions move upwards in a fountain like structure and get deposited with three focused DPF shots on the silicon substrates placed at a distance of 5.0 cm above the anode. The structural properties have been studied using X-ray diffractometer. The surface morphology of the deposited cobalt has been investigated using Atomic Force Microscope (AFM). The nanoparticles have dimensions in the range of 40-80 nm. Magnetic Force Microscope (MFM) studies show that the nanoparticles are magnetic in nature.